Samsung Electronics Co., Ltd.

Sungkyunkwan University

Hakseok Lee

Mun Ja Kim

Byungchul Yoo

Jibeom Yoo

Jihoon Na

Jaewhan Sung

Hyunjune Cho

Myeongjin Jeong

An apparatus for generating extreme ultraviolet (EUV) light includes a raw material supply unit supplying a plasma source for generating EUV light. An EUV light source unit uses a laser to generate plasma from the plasma source. A filter is configured to extract EUV light from the light. A first protective layer is disposed on a front surface of the filter. A frame having a first region exposing at least a portion of the filter or the first protective layer is disposed on the first protective layer. A width of the first region is smaller than a width of the first protective layer and smaller than or equal to a width of the filter.

Apparatus for generating extreme ultraviolet (EUV), method of manufacturing the same, and EUV system

Growing community of inventors

Hwaseong-si, South Korea

Hakseok Lee