Company Filing History:
Years Active: 1987-1989
Title: Innovations by Hakchill Chan
Introduction
Hakchill Chan is a notable inventor based in Corona del Mar, California. He has made significant contributions to the field of materials science, particularly in the development of epitaxially grown layers of HgCdTe on crystalline supports. With a total of four patents to his name, Chan's work has implications for various technological applications.
Latest Patents
Chan's latest patents focus on the epitaxial growth of HgCdTe layers. One of his patents describes a method where a single crystal CdTe substrate is epitaxially grown to a thickness between 1 micron and 5 microns on a crystalline support. A HgTe source is then positioned at a specific distance from the CdTe substrate. The substrate and source are heated together in a thermally insulating ampoule within a defined temperature range for a specified growth time. The process includes both isothermal and non-isothermal growth steps, followed by an optional interdiffusion step to enhance the quality of the final product. Additionally, methods are disclosed to prevent contamination during the synthesis of HgTe and to polish the finished HgCdTe layer.
Career Highlights
Hakchill Chan is currently associated with Ford Aerospace & Communications Corporation. His work at the company has allowed him to explore innovative solutions in the field of semiconductor materials. His expertise in epitaxial growth techniques has positioned him as a valuable asset in advancing the company's technological capabilities.
Collaborations
Chan has collaborated with notable colleagues, including Robert E. Kay and Fred Ju. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Hakchill Chan's contributions to the field of materials science through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in semiconductor technology.