Hak-seung Han

Title: Hak-seung Han: Innovator in Photomask Technology

Introduction

Hak-seung Han is a notable inventor based in Yongin, South Korea. He has made significant contributions to the field of photomask technology, which is essential in the semiconductor manufacturing process. His innovative approach has led to advancements that enhance the efficiency and precision of photomask fabrication.

Latest Patents

Hak-seung Han holds a patent for a "Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the method." This patent outlines a method of fabricating a photomask that includes several steps. These steps involve forming a light-shielding layer and a first resist film on a substrate, exposing regions of the first resist film to a first exposure source, and etching the selectively exposed light-shielding layer. The process continues with the removal of the first resist pattern and the formation of a second resist film, followed by further exposure and etching to create a second light shielding pattern.

Career Highlights

Hak-seung Han is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to apply his innovative ideas in a practical setting, contributing to the company's advancements in semiconductor technology.

Collaborations

He has collaborated with notable coworkers, including Hee-bom Kim and Seong-woon Choi. Their teamwork has fostered an environment of innovation and creativity, leading to significant advancements in their field.

Conclusion

Hak-seung Han is a prominent figure in the realm of photomask technology, with a patent that showcases his innovative methods. His contributions at Samsung Electronics Co., Ltd. and collaborations with talented coworkers highlight his commitment to advancing technology in the semiconductor industry.