Malta, NY, United States of America

Hajime Terazawa

This inventor holds 1 USPTO granted patent. Top assignee: Globalfoundries Inc.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hajime Terazawa. Retrieved from https://idiyas.com/inventor/hajime-terazawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Hajime Terazawa: Innovator in Memory Array Testing

Introduction

Hajime Terazawa is a notable inventor based in Malta, NY (US). He has made significant contributions to the field of memory array testing through his innovative patent. His work is recognized for its potential to enhance the accuracy of on-chip device testing.

Latest Patents

Hajime Terazawa holds a patent for an "In-kerf test structure and testing method for a memory array." This invention discloses a test structure that includes at least one test component with adjoining dummy devices. The design allows for precise testing by connecting input/output pads to the nodes of the test device and dummy devices. This method effectively avoids random accumulation of potential, ensuring accurate current measurements from the selected test device.

Career Highlights

Hajime Terazawa is currently employed at GlobalFoundries Inc., where he continues to develop and refine his innovative ideas. His work in the semiconductor industry has positioned him as a key player in advancing memory array testing technologies.

Collaborations

Some of his notable coworkers include Bipul C Paul and Joseph Versaggi. Their collaborative efforts contribute to the innovative environment at GlobalFoundries Inc.

Conclusion

Hajime Terazawa's contributions to memory array testing through his patent demonstrate his commitment to innovation in the semiconductor field. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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