Fuchu, Japan

Hajime Hirose

This inventor holds 1 USPTO granted patent. Top assignee: Mitaka Kohki Co., Ltd.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hajime Hirose. Retrieved from https://idiyas.com/inventor/hajime-hirose

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Hajime Hirose: Innovator in Noncontact Surface Measurement

Introduction

Hajime Hirose is a notable inventor based in Fuchu, Japan. He has made significant contributions to the field of surface measurement technology. His innovative approach has led to the development of a unique patent that enhances measurement accuracy.

Latest Patents

Hajime Hirose holds a patent for a "Noncontact surface shape measuring method and apparatus." This invention addresses the challenge of measuring surfaces without direct contact. The method calculates a correction value based on the voltage difference between two sensors, even when the return beam does not align with the sensor's center. This correction value is then used to adjust the position of an objective lens, ensuring accurate measurements.

Career Highlights

Hajime Hirose is associated with Mitaka Kohki Co., Ltd., a company known for its advancements in optical measurement technologies. His work has been instrumental in developing solutions that improve measurement precision in various applications.

Collaborations

Hajime has collaborated with notable colleagues, including Katsuhiro Miura and Hideo Kotajima. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

Hajime Hirose's innovative contributions to noncontact surface measurement technology exemplify the impact of dedicated inventors in advancing industrial applications. His work continues to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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