Haiyan Li

Title: Innovations of Haiyan Li in Charged Particle Inspection Systems

Introduction

Haiyan Li is an accomplished inventor based in Hillsboro, OR (US). He has made significant contributions to the field of charged particle inspection systems, particularly in the area of patterning parameter determination. His innovative approach has led to advancements that enhance the efficiency and accuracy of semiconductor manufacturing processes.

Latest Patents

Haiyan Li holds 1 patent titled "Patterning parameter determination using a charged particle inspection system." This patent describes a method for obtaining focus and dose data without the need for special marks. The process utilizes images of in-die features to create a focus/dose matrix wafer. Key dimensions such as critical dimension (CD), CD uniformity (CDU), and edge placement error (EPE) are measured at in-die locations using a charged particle inspection system with a large field of view. The invention employs machine learning or regression methods to establish a relationship between focus and dose and the measured data. This relationship can then be applied to production wafers to determine the necessary focus and dose.

Career Highlights

Haiyan Li is currently employed at ASML Netherlands B.V., a leading company in the semiconductor industry. His work focuses on improving inspection techniques that are crucial for the production of advanced microchips. His expertise in charged particle inspection systems has positioned him as a valuable asset in the field.

Collaborations

Haiyan Li collaborates with Junru Ruan, a fellow professional in the industry. Their combined efforts contribute to the ongoing advancements in semiconductor technology.

Conclusion

Haiyan Li's innovative work in charged particle inspection systems exemplifies the importance of research and development in the semiconductor industry. His contributions are paving the way for more efficient manufacturing processes and improved product quality.