Haixlong Ge

Title: Haixlong Ge: Innovator in Nanoimprinting Technology

Introduction

Haixlong Ge is a prominent inventor based in Nanjing, China. He has made significant contributions to the field of nanoimprinting technology, particularly through his innovative patent work. His expertise lies in developing compositions and processes that enhance the efficiency and effectiveness of nanoimprinting lithography.

Latest Patents

Haixlong Ge holds 1 patent for his invention titled "Compositions and processes for nanoimprinting." This invention focuses on new nanoimprint resist and thin-film compositions designed for use in nanoimprinting lithography. The compositions he developed allow for economical high-throughput mass production, enabling the creation of patterns with features as small as sub-200 nm, and even sub-50 nm.

Career Highlights

Throughout his career, Haixlong Ge has demonstrated a commitment to advancing nanoimprinting technology. His work has been instrumental in pushing the boundaries of what is possible in the field, making significant strides in the production of nanoscale patterns.

Collaborations

Haixlong Ge has collaborated with notable figures in the field, including Stephen Y. Chou and Zengli Fu. These partnerships have further enriched his research and development efforts, leading to innovative solutions in nanoimprinting.

Conclusion

Haixlong Ge is a key figure in the realm of nanoimprinting technology, with a focus on creating efficient processes and compositions. His contributions are paving the way for advancements in the production of nanoscale patterns, showcasing the importance of innovation in this field.