The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2013
Filed:
Oct. 31, 2007
Applicants:
Stephen Y. Chou, Princeton, NJ (US);
Zengli Fu, Monmouth Junction, NJ (US);
Lei Chen, Clarksburg, MD (US);
Haixlong GE, Naking, CN;
Inventors:
Stephen Y. Chou, Princeton, NJ (US);
Zengli Fu, Monmouth Junction, NJ (US);
Lei Chen, Clarksburg, MD (US);
Haixlong Ge, Naking, CN;
Assignee:
Other;
Primary Examiner:
Int. Cl.
CPC ...
B29C 35/08 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention is directed to new nanoimprint resist and thin-film compositions for use in nanoimprinting lithography. The compositions permit economical high-throughput mass production, using nanoimprint processes, of patterns having sub-200 nm, and even sub-50 nm features.
Chou, Stephen. (2013). Compositions and processes for nanoimprinting (U.S. Patent No. 8603386). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8603386
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile