Singapore, Singapore

Haiwen Xu

USPTO Granted Patents = 1 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Haiwen Xu

Introduction

Haiwen Xu is a notable inventor based in Singapore, recognized for his contributions to semiconductor technology. His work has led to advancements in device architectures that utilize strained substrates, which are crucial for enhancing the performance of semiconductor devices. With a focus on innovation, Xu has secured a patent that showcases his expertise in this field.

Latest Patents

Haiwen Xu holds a patent for a device architecture that incorporates tensile and compressive strained substrates. This semiconductor structure includes a base substrate and an insulating layer with a thickness ranging from about 5 nm to about 100 nm. The active layer consists of at least two pluralities of different volumes of semiconductor material, including silicon, germanium, and/or silicon germanium. Notably, the first plurality of volumes exhibits a tensile strain of at least about 0.6%, while the second plurality demonstrates a compressive strain of at least about −0.6%. Additionally, the patent describes methods for preparing a semiconductor structure and a segmented strained silicon-on-insulator device.

Career Highlights

Throughout his career, Haiwen Xu has worked with prestigious organizations, including the National University of Singapore and Soitec. His experience in these institutions has allowed him to collaborate with leading experts in the field and contribute to significant advancements in semiconductor technology.

Collaborations

Haiwen Xu has collaborated with notable colleagues such as Bich-Yen Nguyen and Christophe Maleville. These partnerships have further enriched his research and development efforts, leading to innovative solutions in semiconductor design.

Conclusion

Haiwen Xu's contributions to semiconductor technology through his innovative patent and collaborations highlight his role as a significant inventor in the field. His work continues to influence advancements in device architectures, paving the way for future innovations.

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