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Years Active: 2014-2017
Title: The Innovations of Hailiang Li: A Visionary in Information Processing and Defect Detection
Introduction: Hailiang Li, a prominent inventor based in Beijing, China, has significantly contributed to the fields of information processing and photolithography. With a total of four patents to his name, he has established himself as a visionary, creating solutions that enhance electronic communication and device functionality.
Latest Patents: Hailiang Li's latest patents showcase his ingenuity and commitment to advancing technology. One notable invention is an “Information Processing Apparatus and Information Processing Method.” This patent describes a method applicable to a first electronic device, which involves establishing a communication link with a second electronic device. The apparatus allows for the display of multiple interfaces based on predetermined conditions. The first area displays information from the first device, while the second area presents shared information, thus optimizing the user experience across devices.
Another significant patent is a “Defect Detection System for Extreme Ultraviolet Lithography Mask.” This innovative system utilizes an extreme ultraviolet light source, transmission parts, and a photon sieve to detect defects in lithography masks. By substituting traditional components with a photon sieve, this system achieves lower costs and enhanced resolution, making it a vital tool in the photolithography process.
Career Highlights: Hailiang Li has built a remarkable career, having worked with esteemed organizations such as the Institute of Microelectronics, Chinese Academy of Sciences, and Beijing Lenovo Software Ltd. These roles have allowed him to develop and refine his inventions, positioning him as a leader in his field.
Collaborations: Throughout his career, Hailiang has collaborated with notable professionals including Changqing Xie and Ming Liu. These partnerships have fostered innovative ideas and contributed to the successful development of his patents.
Conclusion: Hailiang Li's contributions to innovations in information processing and defect detection demonstrate his exceptional talent and dedication to technology advancement. His work continues to influence various industries, paving the way for future developments in electronics and photolithography. As he advances his research and innovation endeavors, the technology community eagerly anticipates his next ideas and creations.