Beijing, China

Haifeng Liu

This inventor holds 21 USPTO granted patents and 6 published patent applications and 1 EPO patent, primarily in Display Technology. Top assignees: International Business Machines Corporation, Hefei Xinsheng Optoelectronics Technology Co., Ltd., Boe Technology Group Co., Ltd.. Active years: 2012-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Haifeng Liu. Retrieved from https://idiyas.com/inventor/haifeng-liu-gr9gbi19

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 21 

% Patents Active = 57.1

 

Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2012-2022

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Areas of Expertise:
Display Panel
Curved Display
Image Quality
Risk Factor Evaluation
LED Technology
Array Substrate
Timing Controller
Data Evaluation
Statistically Significant Therapies
Event Log
Process Model
Case Management
21 patents (USPTO):Explore Patents

Title: Haifeng Liu: Pioneering Inventor from Beijing

Introduction: Haifeng Liu is a distinguished inventor hailing from Beijing, China, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Haifeng Liu holds several recent patents in the areas of artificial intelligence, renewable energy, and advanced robotics, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Haifeng Liu has worked with leading tech companies in Beijing, spearheading research and development projects that have led to significant technological advancements.

Collaborations: Throughout his career, Haifeng Liu has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge-sharing.

Conclusion: Haifeng Liu's passion for innovation and his relentless pursuit of technological excellence continue to inspire the next generation of inventors and researchers worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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