The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 29, 2022

Filed:

Sep. 06, 2019
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Jing Li, Beijing, CN;

Xiang Li, Beijing, CN;

Haifeng Liu, Beijing, CN;

Guo Tong Xie, Beijing, CN;

Yi Qin Yu, Beijing, CN;

Shi Lei Zhang, Beijing, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06N 7/00 (2006.01);
U.S. Cl.
CPC ...
G06N 7/005 (2013.01);
Abstract

A method for detecting deviations between an event log and a process model includes converting the process model into a probability process model, the probability process model comprising multiple nodes in multiple hierarchies and probability distribution associated with the multiple nodes, a leaf node among the multiple nodes corresponding to an activity in the process model; detecting differences between at least one event sequence contained in the event log and the probability process model according to a correspondence relationship; and identifying the differences as the deviations in response to the differences exceeding a predefined threshold; wherein the correspondence relationship describes a correspondence relationship between an event in one event sequence of the at least one event sequence and a leaf node in the probability process model.


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