This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Canton Litho Material Technology Inc.. Active years: 2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025
Title: The Innovations of Hai Deng
Introduction
Hai Deng is a prominent inventor based in Guangzhou, China. He has made significant contributions to the field of materials science, particularly in the development of advanced photoresist materials. His work is crucial for the advancement of integrated circuits, which are essential in modern electronics.
Latest Patents
Hai Deng holds a patent for a highly sequenced copolymer designed for dual-tone photoresists. The patent, titled "Highly sequenced copolymer for dual-tone photoresists, resist composition and patterning process thereof," presents a resin that includes a highly sequenced copolymer. This innovative resist composition demonstrates excellent performance and has the potential to enhance the development of integrated circuits. He has 1 patent to his name.
Career Highlights
Deng is currently employed at Canton Litho Material Technology Inc., where he continues to push the boundaries of material innovation. His expertise in photoresist technology has positioned him as a key player in the industry.
Collaborations
One of his notable coworkers is Min Cao, with whom he collaborates on various projects related to material science and photoresist development.
Conclusion
Hai Deng's contributions to the field of materials science, particularly through his innovative patent, highlight his role as a significant inventor in the industry. His work continues to influence the advancement of integrated circuits and related technologies.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile