Hagit Sade

Title: Hagit Sade: Innovator in XRF Marking Technology

Introduction

Hagit Sade is a notable inventor based in Ramat Gan, Israel. She has made significant contributions to the field of electronic systems through her innovative work in XRF marking technology. Her expertise and creativity have led to the development of a unique patent that enhances the functionality of electronic components.

Latest Patents

Hagit Sade holds a patent for a "Method and a system for XRF marking and reading XRF marks of electronic systems." This patent describes a method for producing an XRF readable mark, which includes providing an XRF marking composition with specific relative concentrations of one or more chemical elements. The process involves fabricating a multilayer structure of the XRF readable mark, which emits an XRF signal indicative of a predetermined XRF signature when irradiated by XRF exciting radiation. This innovative approach includes implementing an attenuation layer with elements that exhibit high absorbance for XRF exciting radiation and/or background, along with a marking layer comprising the XRF marking composition.

Career Highlights

Hagit Sade has made a significant impact in her field through her work at Security Matters Ltd. Her dedication to advancing technology in electronic systems has positioned her as a key player in the industry. With her patent, she has demonstrated her ability to innovate and solve complex problems in electronic marking.

Collaborations

Hagit collaborates with talented individuals such as Nataly Tal and Mor Kaplinsky. Their combined expertise contributes to the success of their projects and enhances the innovative environment at Security Matters Ltd.

Conclusion

Hagit Sade's contributions to XRF marking technology exemplify her innovative spirit and dedication to advancing electronic systems. Her patent and collaborative efforts highlight her role as a significant inventor in her field.