The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2021
Filed:
Mar. 30, 2020
Security Matters Ltd., D.N. Hevel Eilot, IL;
Nataly Tal, Nes Ziona, IL;
Mor Kaplinsky, Herzliya, IL;
Tehila Nahum, Holon, IL;
Hagit Sade, Ramat-Gan, IL;
Dana Gasper, Tel Aviv, IL;
Ron Dafni, Tel Aviv, IL;
Chen Nachmias, Tel Aviv, IL;
Michal Firstenberg, Rehovot, IL;
Avital Trachtman, Lod, IL;
Haggai Alon, Kibbutz Naan, IL;
Nadav Yoran, Tel Aviv, IL;
Tzemah Kislev, Mazkeret Bathya, IL;
Security Matters Ltd., D.N. Hevel Eilot, IL;
Abstract
There are disclosed a method of producing an XRF readable mark, the XRF readable mark and a component comprising thereof. The method comprises providing an XRF marking composition with specific relative concentrations of one or more chemical elements and fabricating a multilayer structure of the XRF readable mark. The relative concentrations are selected such that in response to irradiation of the XRF marking composition by XRF exciting radiation, the XRF marking composition emits an XRF signal indicative of a predetermined XRF signature. Fabricating the multilayer structure comprises implementing an attenuation layer with at least one element exhibiting high absorbance for an XRF exciting radiation and/or an XRF background; and implementing a marking layer comprising said XRF marking composition.