Hwaseong-si, South Korea

Haeri Yoo


Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Haeri Yoo - Innovator in Semiconductor Technology

Introduction

Haeri Yoo is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of advanced semiconductor devices that enhance performance and efficiency.

Latest Patents

Haeri Yoo holds a patent for a semiconductor device and stacked semiconductor chips that include through contacts. This invention features a substrate with a logic cell region and a connection region, along with a dummy transistor and an intermediate connection layer. The design incorporates a first metal layer, an etch stop layer, and a through contact that penetrates the connection region. The upper portion of the through contact protrudes above the etch stop layer, and a protection insulating pattern covers both the upper side surface and the top surface of the through contact. This innovative design aims to improve the functionality and reliability of semiconductor devices.

Career Highlights

Haeri Yoo is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to be at the forefront of semiconductor innovation. Yoo's expertise and dedication have contributed to the company's reputation for excellence in electronic products.

Collaborations

Haeri Yoo has collaborated with notable colleagues, including Shaofeng Ding and Minguk Kang. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in semiconductor technology.

Conclusion

Haeri Yoo is a distinguished inventor whose work in semiconductor technology has made a lasting impact. His innovative patent and contributions to Samsung Electronics Co., Ltd. highlight his commitment to advancing the field. His collaborations with other talented professionals further enhance the potential for future innovations in this critical area of technology.

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