This inventor holds 1 USPTO granted patent. Top assignees: Samsung Electronics Co., Ltd., Seoul National University. Active years: 2026.
Company Filing History:
1 out of 132,107 
1 out of 1,766 
Years Active: 2026
Title: Hae Min Yang: Innovator in Photoresist Technology
Introduction
Hae Min Yang is a prominent inventor based in Seoul, South Korea. She has made significant contributions to the field of photoresist technology, particularly through her innovative patent work. Her expertise and research have positioned her as a key figure in the development of advanced materials for semiconductor manufacturing.
Latest Patents
Hae Min Yang holds a patent for a photoresist composition that includes a chrysene compound. The patent details a method of forming a pattern using this composition and a method of fabricating 6-nitrochrysene. The photoresist composition comprises a polymer resin, a photo acid generator, a quencher, an organic solvent, and an etching resistance enhancer. This composition is designed to improve the efficiency and effectiveness of pattern formation in semiconductor applications.
Career Highlights
Throughout her career, Hae Min Yang has worked with leading organizations, including Samsung Electronics Co., Ltd. and Seoul National University. Her work in these institutions has allowed her to collaborate with some of the brightest minds in the field, further enhancing her contributions to innovation in photoresist technology.
Collaborations
Hae Min Yang has collaborated with notable colleagues, including Jonghoon Kim and Suk Koo Hong. These partnerships have fostered a dynamic exchange of ideas and have been instrumental in advancing her research and development efforts.
Conclusion
Hae Min Yang's contributions to photoresist technology exemplify her innovative spirit and dedication to advancing the field. Her patent work and collaborations highlight her role as a leading inventor in the industry.