Hae Jin Lee

Title: Hae Jin Lee: Innovator in Substrate Processing Technologies

Introduction

Hae Jin Lee is a notable inventor based in Chungcheongnam-do, South Korea. She has made significant contributions to the field of substrate processing, holding a total of three patents. Her innovative methods aim to enhance manufacturing processes by omitting traditional photolithographic techniques.

Latest Patents

One of Hae Jin Lee's latest patents is a method of processing a substrate that eliminates the need for a photolithographic process. This method involves forming at least one layer on a stepped structure with an upper surface, a lower surface, and a connecting side surface. The process includes selectively densifying portions of the layer on both the upper and lower surfaces through asymmetric plasma application. Additionally, an isotropic etching process is performed on the layer, allowing for the separation of the portions formed on the upper and lower surfaces.

Career Highlights

Hae Jin Lee is currently employed at Asm IP Holding B.V., where she continues to develop innovative solutions in substrate processing. Her work has been instrumental in advancing manufacturing technologies, making processes more efficient and cost-effective.

Collaborations

Hae Jin Lee collaborates with talented coworkers, including Seung Ju Chun and Yong Min Yoo. Their combined expertise contributes to the success of their projects and the advancement of their field.

Conclusion

Hae Jin Lee is a pioneering inventor whose work in substrate processing is shaping the future of manufacturing technologies. Her innovative methods and collaborative spirit are paving the way for new advancements in the industry.