Company Filing History:
1 out of 27,040 
1 out of 380 Years Active: 2022
Title: Haccheol Kim: Innovator in Thin Film Etching Technology
Introduction: Haccheol Kim is a notable inventor based in Yongin-si, South Korea, recognized for his contributions to the field of thin film technology. With a keen focus on enhancing manufacturing processes, he has a patent that reflects his innovative approach to metal pattern formation.
Latest Patents: Haccheol Kim holds a patent for a thin film etchant composition and the corresponding method of forming a metal pattern using it. This innovative composition is designed to prevent the re-adsorption of an etched metal while ensuring uniform etching of thin films. The formulation includes approximately 43 wt % to 46 wt % of phosphoric acid, 5 wt % to 8 wt % of nitric acid, 10 wt % to 17 wt % of acetic acid, 1 wt % to 3 wt % of iron nitrate, 0.7 wt % to 1.5 wt % of phosphate, supplemented with deionized water to complete the composition.
Career Highlights: Throughout his career, Haccheol Kim has been associated with prominent companies in the industry. He worked at Samsung Display Co., Ltd., where he contributed to the advancement of display technologies. He also gained valuable experience at Dongwoo Fine-Chem Co., Ltd., further honing his expertise in chemical formulations pertinent to thin film processes.
Collaborations: Haccheol Kim’s work has involved collaboration with talented professionals, including coworkers Jinhyung Kim and Joohwan Chung. These collaborations have likely facilitated the sharing of ideas and techniques, enhancing the innovation process in their respective projects.
Conclusion: Haccheol Kim exemplifies the spirit of innovation in the field of thin film technology. His patent for a unique etchant composition highlights his ability to address manufacturing challenges effectively. With his background in leading companies and collaboration with fellow innovators, he is poised to make significant contributions to the technological landscape in the future.