Samsung Display Co., Ltd.

Dongwoo Fine-chem Co., Ltd.

Haccheol Kim

Changsoo Kim

Jinhyung Kim

Giyong Nam

Youngchul Park

Daesung Lim

Sangtae Kim

Kyungbo Shim

Jinsook Kim

Byungsu Lee

Sanghoon Jang

Jungseek Jung

Joohwan Chung

Dongki Kim

A thin film etchant composition for preventing re-adsorption of an etched metal and uniformly etching a thin film is provided. The thin film etchant composition includes about 43 wt % to about 46 wt % of phosphoric acid, about 5 wt % to about 8 wt % of nitric acid, about 10 wt % to about 17 wt % of acetic acid, about 1 wt % to about 3 wt % of iron nitrate, about 0.7 wt % to about 1.5 wt % of phosphate, and deionized water as a remaining amount based on a total weight of the thin film etchant composition.

Thin film etchant composition and method of forming metal pattern by using the same

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Yongin-si, South Korea

Haccheol Kim