Hadong-gun, South Korea

Ha Yeong Kang

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Pukyong National University. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ha Yeong Kang. Retrieved from https://idiyas.com/inventor/ha-yeong-kang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Ha Yeong Kang - Innovator in X-Ray Shielding Materials

Introduction

Ha Yeong Kang is an inventive woman based in Hadong-gun, South Korea. She is focused on developing innovative materials for X-ray shielding. Although she currently holds no granted patents, her work in this field is noteworthy.

Latest Patent Applications

Ha Yeong Kang has submitted several patent applications related to lead-free X-ray shielding materials. One of her latest applications is for a BiI3-PDMS composite material for X-ray shielding and the manufacturing method thereof. This method involves a three-step process: first, producing porous PDMS (Polydimethylsiloxane); second, creating a mixed solution of BiI and THF; and third, immersing the porous PDMS into the mixed solution to load BiI into the porous PDMS, resulting in a BiI-PDMS composite material. Another application focuses on a bismuth halide compound-PDMS composite material for X-ray shielding. This method also includes three steps: producing porous PDMS, creating a mixed solution of the bismuth halide compound and THF, and immersing the porous PDMS into the mixed solution to load the bismuth halide compound into the porous PDMS, producing a bismuth halide compound-PDMS composite material.

Conclusion

Ha Yeong Kang is making significant strides in the development of innovative X-ray shielding materials. Her latest patent applications reflect her commitment to creating safer and more effective solutions in this important field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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