The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2026

Filed:

Nov. 07, 2023
Applicant:

Pukyong National University Industry-university Cooperation Foundation, Busan, KR;

Inventors:

Junghwan Kim, Busan, KR;

Seok Gyu Kang, Gimhae-si, KR;

Ha Yeong Kang, Hadong-gun, KR;

Dae Seong Kwon, Gimhae-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21F 1/00 (2006.01); G21F 3/00 (2006.01);
U.S. Cl.
CPC ...
G21F 1/00 (2013.01); G21F 3/00 (2013.01);
Abstract

A method for producing a lead-free X-ray shielding material using a bismuth halide compound is provided, the method including a first step of producing porous PDMS (Polydimethylsiloxane); a second step of producing a mixed solution of the bismuth halide compound and THF; and a third step of immersing the porous PDMS into the mixed solution such that the bismuth halide compound is loaded into the porous PDMS to produce a bismuth halide compound-PDMS composite material.


Find Patent Forward Citations

Kim, Junghwan. (2026). Bismuth halide compound-pdms composite material for x-ray shielding and manufacturing method thereof (U.S. Patent No. 12580090). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12580090

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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