H Peter Hey

Title: H Peter Hey: Innovator in Film Deposition Technology

Introduction

H Peter Hey is a notable inventor based in San Jose, CA, with a significant contribution to the field of film deposition technology. He holds a total of 9 patents, showcasing his expertise and innovative spirit in this specialized area.

Latest Patents

Among his latest patents is a method for deposition rate control on wafers with varying characteristics. This invention presents a method and apparatus for depositing a film on a substrate. The process involves determining a characteristic of the substrate, followed by heating it using an upper and a lower heat source. The ratio of heat supplied from these sources is dependent on the determined wafer characteristic. Another significant patent focuses on improving film deposition uniformity. This method involves depositing a prewafer reaction layer onto a susceptor in a reaction chamber before film deposition. A deposition gas is then introduced, flowing over the prewafer reaction layer and the substrate to form a film.

Career Highlights

H Peter Hey is currently associated with Applied Materials, Inc., a leading company in the semiconductor industry. His work has significantly impacted the efficiency and effectiveness of film deposition processes, making him a valuable asset to his organization.

Collaborations

Throughout his career, H Peter Hey has collaborated with esteemed colleagues, including Roger N Anderson and Israel Beinglass. These collaborations have likely contributed to the advancement of technology in their field.

Conclusion

H Peter Hey's contributions to film deposition technology through his innovative patents and collaborations highlight his importance in the industry. His work continues to influence advancements in semiconductor manufacturing processes.