Monsey, NY, United States of America

H Eric Fischer

This inventor holds 1 USPTO granted patent. Top assignee: Atmi Ecosys Corporation. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: H Eric Fischer. Retrieved from https://idiyas.com/inventor/h-eric-fischer-u59zofi4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: H Eric Fischer: Innovator in Semiconductor Process Effluents

Introduction

H Eric Fischer is a notable inventor based in Monsey, NY (US). He has made significant contributions to the field of semiconductor technology through his innovative patent.

Latest Patents

H Eric Fischer holds a patent for "Metallo-oxomeric scrubber compositions." This invention focuses on scavengers designed to remove acidic or corrosive gaseous components from semiconductor process effluents. The patent describes a metallic macromer that comprises a coordinated complex of metal coordination atoms linked to oxomeric moieties, which include carbonate, sulfite, carboxylate, and silicate. Additionally, the patent outlines methods for synthesizing these scavengers and a method for cleaning exhaust gas containing corrosive or acidic gaseous components such as hydrogen halide, chlorine, boron trihalide, thionyl chloride, and tungsten hexafluoride.

Career Highlights

H Eric Fischer is associated with Atmi Ecosys Corporation, where he applies his expertise in developing advanced materials for semiconductor applications. His work has been instrumental in enhancing the efficiency and safety of semiconductor manufacturing processes.

Collaborations

Throughout his career, H Eric Fischer has likely collaborated with various professionals and organizations in the semiconductor industry. These collaborations have contributed to the advancement of technologies that address environmental concerns related to semiconductor manufacturing.

Conclusion

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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