H C Yu

Title: H C Yu - Innovator in Semiconductor Technology

Introduction

H C Yu is a prominent inventor based in Yi-Lan Hsien, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His innovative methods have advanced the fabrication processes of semiconductor devices, showcasing his expertise and dedication to the industry.

Latest Patents

H C Yu's latest patents include a "Method of Fabricating a Semiconductive Device" and a "Method for Forming an Inter-Layer Dielectric Layer." The first patent describes a method where an insulation layer is formed over the gate electrode and substrate. This insulation layer is anisotropically etched away, except for a portion surrounding the sidewall of the gate electrode, which forms a spacer. The tip of the spacer is designed to be at the same height as the upper surface of the liner layer and lower than the upper surface of the gate electrode. This design results in an increased exposed area of the gate electrode surface, enhancing device performance. The second patent outlines a method for fabricating an inter-layer dielectric layer. In this process, a sequence of first polysilicon lines, a first inter-layer dielectric layer, and second polysilicon lines are formed on the substrate. A second inter-layer dielectric layer is then created, covering the second polysilicon lines. Following this, a spin-on glass layer is applied, which is subsequently etched back to remove the spin-on glass layer and partially remove the second inter-layer dielectric layer. Finally, a cover layer and an oxide layer are formed to complete the structure.

Career Highlights

H C Yu is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to apply his innovative ideas and contribute to the development of advanced semiconductor technologies.

Collaborations

Throughout his career, H C Yu has collaborated with notable colleagues, including Hsi-Mao Hsiao and Chun-Lung Chen. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

H C Yu's contributions to semiconductor technology through his patents and work at United Microelectronics Corporation highlight his role as a key innovator in the field. His methods for fabricating semiconductor devices and inter-layer dielectric layers demonstrate his commitment to advancing technology.