Company Filing History:
Years Active: 2016-2017
Title: Gyeong-seop Kim: Innovator in Semiconductor Fabrication
Introduction
Gyeong-seop Kim is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on fine patterning methods that are crucial for the fabrication of advanced semiconductor devices.
Latest Patents
Gyeong-seop Kim's latest patents include innovative fine-patterning methods and methods of fabricating semiconductor devices using these techniques. One of the key aspects of his fine-patterning method involves forming a mask layer with lower and upper mask layers on an underlying layer. The process includes creating a pair of sacrificial patterns on the mask layer, followed by the formation of a connection spacer between the sacrificial patterns and first spacers. These spacers are strategically placed apart from each other, with the sacrificial patterns interposed between them, covering the side surfaces of the sacrificial patterns. The upper mask layer is then etched using the first spacers and the connection spacer as an etch mask to create upper mask patterns. Subsequently, second spacers are formed to cover the side surfaces of the upper mask patterns, and the lower mask layer is etched using the second spacers as an etch mask to create lower mask patterns. Finally, the underlying layer is etched using the lower mask patterns as an etch mask.
Career Highlights
Gyeong-seop Kim is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics and semiconductor industry. His work at Samsung has allowed him to be at the forefront of technological advancements in semiconductor fabrication.
Collaborations
Throughout his career, Gyeong-seop Kim has collaborated with notable colleagues, including Sungbong Kim and Myeongcheol Kim. These collaborations have further enhanced his contributions to the field of semiconductor technology.
Conclusion
Gyeong-seop Kim is a distinguished inventor whose work in fine patterning methods has significantly impacted semiconductor fabrication. His innovative approaches continue to shape the future of technology in this critical industry.