Rehovot, Israel

Gurjeet Singh

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials Israel Limited. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gurjeet Singh. Retrieved from https://idiyas.com/inventor/gurjeet-singh-9ut9e64n

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Innovations by Gurjeet Singh

Introduction

Gurjeet Singh is a notable inventor based in Rehovot, Israel. He has made significant contributions to the field of process monitoring through his innovative methods. His work focuses on determining defect material elements, which is crucial in various technological applications.

Latest Patents

Gurjeet Singh holds one patent that outlines a method for determining a defect material element. This method involves acquiring an electromagnetic emission spectrum of a defect using a charged particle beam system and applying a spectroscopy process. Additionally, it includes obtaining a backscattered electron (BSE) image of the defect area. The process further determines whether any ambiguity exists in the electromagnetic emission spectrum and resolves it based on the BSE image.

Career Highlights

Gurjeet Singh is currently employed at Applied Materials Israel Limited, where he continues to develop and refine his innovative techniques. His expertise in process monitoring has positioned him as a valuable asset in his field.

Collaborations

Some of Gurjeet's coworkers include Dror Shemesh and Eugene T Bullock. Their collaboration contributes to the advancement of technologies in their respective areas of expertise.

Conclusion

Gurjeet Singh's innovative work in process monitoring exemplifies the importance of addressing defects in materials through advanced methodologies. His contributions are significant in enhancing the quality and reliability of technological applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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