Guoqing Leng

Title: Guoqing Leng: Innovator in Semiconductor Technology

Introduction

Guoqing Leng is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to advancements that enhance the manufacturing processes of semiconductor devices.

Latest Patents

Guoqing Leng holds a patent for a method titled "Method for manufacturing trench in semiconductor substrate, and semiconductor device." This patent describes a process that includes providing a semiconductor substrate, forming a hard mask layer, and etching to create a trench. The trench features a side surface and a bottom surface with an angle greater than 90 degrees. The method further involves irradiating the trench with a laser beam to melt a semiconductor material, followed by cooling the substrate to reshape the trench surfaces for improved roughness. This invention is crucial for enhancing the performance and efficiency of semiconductor devices.

Career Highlights

Guoqing Leng is associated with Gta Semiconductor Co., Ltd., where he applies his expertise in semiconductor manufacturing. His work focuses on developing innovative methods that improve the quality and efficiency of semiconductor production. His contributions have been instrumental in advancing the capabilities of the company in the competitive semiconductor industry.

Conclusion

Guoqing Leng is a notable inventor whose work in semiconductor technology has led to significant advancements in manufacturing processes. His patent reflects his commitment to innovation and excellence in the field. His contributions continue to shape the future of semiconductor devices.