This inventor holds 1 USPTO granted patent. Top assignee: Tcl Zhonghuan Renewable Energy Technology Co., Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Guoqing Fan and Silicon Charging Technology
Introduction
Guoqing Fan is an inventor based in Tianjin, China, associated with TCL Zhonghuan Renewable Energy Technology Co., Ltd. His patent work concerns silicon-material charging and single-crystal preparation.
Latest Patents
Fan is listed as an inventor on 1 patent: “Charging Method for Silicon Material and Preparation Method for Single Crystal.” The invention describes placing a first material layer in a crucible and covering it with a second layer during vacuuming. It also outlines a single-crystal preparation process in which a lid closes the crucible before it is vacuumed, after which the closed crucible is lifted into a single-crystal furnace and its pressure is relieved.
Career Highlights
Fan’s disclosed patent focuses on the handling of silicon materials during crucible charging and the preparation of single crystals. The described method is intended to protect the first material layer during vacuuming and to support the subsequent crystal-preparation process.
Collaborations
Fan is associated with TCL Zhonghuan Renewable Energy Technology Co., Ltd. His listed coworkers include Lin Wang and Zhi Yang.
Conclusion
Guoqing Fan’s patent activity centers on a silicon charging method and its application to single-crystal preparation, reflecting his work in an area relevant to renewable-energy technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile