This inventor holds 1 USPTO granted patent. Top assignee: Versum Materials US, LLC. Active years: 2025.
Company Filing History:
Years Active: 2025
Title: Guocan Li: Innovator in Thin Film Deposition Technologies
Introduction
Guocan Li is a prominent inventor based in Tempe, AZ, known for his contributions to the field of thin film deposition. His innovative work focuses on the development of Group V and VI transition metal precursors, which are essential for creating high-quality films used in various applications.
Latest Patents
Guocan Li holds a patent for "Group V and VI transition metal precursors for thin film deposition." This patent describes Group V and VI compounds utilized as precursors for depositing films that contain these elements. The invention highlights the use of ligands with alkyl, amide, imide, amidinate groups, and cyclopentadienyl (Cp) ligands to form complexes that serve as precursors. The patent includes various examples of precursor compounds, such as Cp amide imide alkyl vanadium compounds and alkylimide vanadium trichloride compounds. These precursors are designed for deposition on substrate surfaces, ensuring superior film properties like uniformity, continuity, and low resistance.
Career Highlights
Guocan Li is currently employed at Versum Materials US, LLC, where he continues to advance his research and development efforts in thin film technologies. His work has significantly impacted the materials science field, particularly in the production of metal-containing films.
Collaborations
Guocan Li has collaborated with notable colleagues, including Sergei Vladimirovich Ivanov and Xinjian Lei, to further enhance the research and application of thin film deposition technologies.
Conclusion
Guocan Li's innovative contributions to the field of thin film deposition through his patented technologies demonstrate his expertise and commitment to advancing materials science. His work continues to influence the development of high-performance films in various industries.