Guo-Qiang Lo

Title: Guo-Qiang Lo: Innovator in Semiconductor Technology

Introduction

Guo-Qiang Lo is a prominent inventor based in Portland, OR (US). He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work focuses on innovative structures and methods that enhance the performance and reliability of semiconductor devices.

Latest Patents

One of his latest patents is for a thin film resistor structure. This invention relates to a thin film resistor formed over a semiconductor substrate. A gate structure is formed, and a dielectric layer is created over the gate structure. A via is then etched to expose a conductive layer of the gate structure. A layer of titanium nitride is deposited, followed by a rapid thermal anneal in an oxygen ambient. This process incorporates oxygen into the titanium nitride, forming a titanium oxynitride film. A dielectric material is then deposited and etched back to create a dielectric plug that fills the remaining portion of the via. The titanium oxynitride film is patterned to form a structure that is electrically coupled to the gate structure.

Another notable patent involves a method for forming a shallow trench isolation structure with a deep oxide region. This invention describes a shallow trench isolation structure and the method for its formation on a semiconductor substrate. A masking structure, including a hard mask, is formed over the substrate, and trenches are etched into the semiconductor. Oxidation enhancing species are implanted into the bottom surface of the trenches, followed by an oxidation process. This results in a deep oxidation region below the trench bottom and thinner oxidation regions along the trench sides. A dielectric material is then deposited to fill the trenches, and a chemical mechanical polishing process is performed to remove excess dielectric film over the hard mask. Finally, the hard mask is removed, producing a void-free shallow trench isolation structure.

Career Highlights

Guo-Qiang Lo is currently employed at Integrated Device Technology, Inc., where he continues to innovate in semiconductor technology. His work has significantly impacted the development of advanced semiconductor devices.

Collaborations

He has collaborated with notable coworkers, including Shih-Ked Lee and Wanqing Cao, contributing to various projects and advancements in the field.

Conclusion

Guo-Qiang Lo's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His innovative approaches continue to shape the future of semiconductor devices.