Guo-Chih Yen

Title: Guo-Chih Yen: Innovator in Lithography Systems

Introduction

Guo-Chih Yen is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor processing through his innovative work in lithography systems. His expertise and dedication to advancing technology have led to the development of a notable patent.

Latest Patents

Guo-Chih Yen holds a patent for a lithography system and methods. This patent describes a method that includes placing a mask on a mask stage and a pellicle assembly on a pellicle stage. The pellicle assembly includes a pellicle, and the method involves determining whether the defect level of the pellicle is less than a selected value by scanning it with a first optical detector. The process culminates in forming a protected mask assembly by mounting the pellicle assembly to the mask assembly, followed by performing semiconductor processing using the protected mask assembly. This innovation is crucial for enhancing the precision and reliability of semiconductor manufacturing.

Career Highlights

Guo-Chih Yen is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work at this esteemed company has allowed him to contribute to cutting-edge technologies and advancements in semiconductor fabrication.

Collaborations

Throughout his career, Guo-Chih Yen has collaborated with talented individuals such as Chen-Pin Cheng and Tsun-Cheng Tang. These collaborations have fostered an environment of innovation and have led to the successful development of various technologies in the semiconductor field.

Conclusion

Guo-Chih Yen's contributions to lithography systems and semiconductor processing exemplify his commitment to innovation. His patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key figure in advancing technology in the semiconductor industry.