This inventor holds 1 USPTO granted patent. Top assignee: Infineon Technologies Ag. Active years: 2005.
Company Filing History:
Years Active: 2005
Title: Gunther Ruhl: Innovator in Halftone Phase Mask Production
Introduction
Gunther Ruhl is a notable inventor based in Dorfen, Germany. He has made significant contributions to the field of semiconductor technology, particularly in the production of halftone phase masks. His innovative approach has led to advancements that are crucial for the manufacturing of high-precision optical components.
Latest Patents
Ruhl holds a patent for a production method for a halftone phase mask. This invention involves a process that includes an SiO substrate, an overlying refractory metal SiN phase shifter layer, and an overlying chromium oxide or chromium mask layer. The method consists of several steps: the provision of a mask on the chromium oxide or chromium mask layer, etching of the chromium oxide or chromium mask layer to form a hard mask, and selective etching of the refractory metal SiN phase shifter layer using the hard mask in a plasma with a chlorine-containing and/or hydrogen-chloride-containing main gas.
Career Highlights
Gunther Ruhl is currently employed at Infineon Technologies AG, a leading company in semiconductor solutions. His work at Infineon has allowed him to apply his innovative ideas in a practical setting, contributing to the company's reputation for excellence in technology.
Collaborations
Ruhl has collaborated with his coworker, Josef Mathuni, to further enhance the development of semiconductor technologies. Their partnership has fostered a creative environment that encourages innovation and problem-solving.
Conclusion
Gunther Ruhl's contributions to the field of semiconductor technology, particularly through his patent for a halftone phase mask production method, highlight his role as an influential inventor. His work continues to impact the industry positively, showcasing the importance of innovation in technology.