Company Filing History:
Years Active: 2015
Title: Gun Sari Mari Berglund: Innovator in Charged Particle Lithography
Introduction
Gun Sari Mari Berglund is a notable inventor based in RM Delft, Netherlands. He has made significant contributions to the field of lithography, particularly through his innovative patent that enhances the efficiency of charged particle lithography systems.
Latest Patents
Berglund holds a patent for a "Lithography system and method of refracting." This invention involves a charged particle lithography system designed for transferring patterns onto surfaces, such as wafers. The system includes a charged particle source that generates a diverging charged particle beam, along with a converging means for refracting this beam. The converging means consists of a first electrode and an aperture array element that forms a second electrode, creating an electric field between the two electrodes.
Career Highlights
Berglund is associated with Mapper Lithography IP B.V., where he applies his expertise in developing advanced lithography technologies. His work has been instrumental in pushing the boundaries of what is possible in the field of semiconductor manufacturing.
Collaborations
Berglund collaborates with talented individuals such as Alexander Hendrik Vincent Van Veen and Yanxia Zhang. Their combined efforts contribute to the innovative projects at Mapper Lithography IP B.V.
Conclusion
Gun Sari Mari Berglund is a key figure in the advancement of charged particle lithography, with a focus on improving the efficiency and effectiveness of lithography systems. His contributions are paving the way for future innovations in the semiconductor industry.