The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2015
Filed:
Nov. 14, 2011
Alexander Hendrik Vincent Van Veen, ER Rotterdam, NL;
Yanxia Zhang, NC Eindhoven, NL;
Gun Sari Mari Berglund, RM Delft, NL;
Pieter Kruit, EB Delft, NL;
Alexander Hendrik Vincent Van Veen, ER Rotterdam, NL;
Yanxia Zhang, NC Eindhoven, NL;
Gun Sari Mari Berglund, RM Delft, NL;
Pieter Kruit, EB Delft, NL;
MAPPER LITHOGRAPHY IP B.V., Delft, NL;
Abstract
A charged particle lithography system for transferring a pattern onto the surface of a target, such as a wafer, comprising a charged particle source adapted for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam, the converging means comprising a first electrode, and an aperture array element comprising a plurality of apertures, the aperture array element forming a second electrode, wherein the system is adapted for creating an electric field between the first electrode and the second electrode.