Corenc, France

Guillaume Vienne

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Unity Semiconductor Corporation. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Guillaume Vienne. Retrieved from https://idiyas.com/inventor/guillaume-vienne-fl2g8okp

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Guillaume Vienne

Introduction

Guillaume Vienne is a notable inventor based in Corenc, France. He has made significant contributions to the field of optical inspection technology. His work focuses on enhancing the efficiency and accuracy of substrate inspection processes.

Latest Patents

Guillaume Vienne holds a patent for a "System for optical inspection of a substrate using same or different wavelengths." This innovative system comprises an illumination device that defines an inspection area on the substrate, a support to receive the substrate, and a detection device that defines a detection area on the substrate. Notably, the inspection area is positioned ahead of at least a portion of the detection area with respect to the scanning direction. This design improves the overall inspection process.

Career Highlights

Guillaume Vienne is currently associated with Unity Semiconductor Corporation, where he applies his expertise in optical inspection technologies. His work at the company has contributed to advancements in semiconductor manufacturing and quality control.

Collaborations

Throughout his career, Guillaume has collaborated with talented individuals such as Mayeul Durand De Gevigney and Kaiss Benhadjsalem. These collaborations have fostered innovation and have led to the development of cutting-edge technologies in their field.

Conclusion

Guillaume Vienne's contributions to optical inspection technology exemplify the impact of innovative thinking in the semiconductor industry. His patent and collaborative efforts highlight the importance of continuous advancement in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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