Jiangsu, China

Guichuang Zhu

This inventor holds 1 USPTO granted patent. Top assignees: Csmc Technologies Fab2 Co., Ltd., Southeast University. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Guichuang Zhu. Retrieved from https://idiyas.com/inventor/guichuang-zhu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: The Innovations of Guichuang Zhu

Guichuang Zhu is a notable inventor based in Jiangsu, China. He has made significant contributions to the field of semiconductor technology. His work has led to the development of innovative devices that enhance electronic performance.

Latest Patents

Guichuang Zhu holds a patent for a laterally double-diffused metal oxide semiconductor device. This device includes a drift region with a first conductivity type, a first body region with a second conductivity type, and several other regions that work together to improve functionality. The design features a source region and a contact region, both contributing to the device's efficiency and effectiveness in electronic applications.

Career Highlights

Throughout his career, Guichuang Zhu has worked with esteemed institutions such as Southeast University and CSMC Technologies Fab2 Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Guichuang Zhu has collaborated with notable colleagues, including Jing Zhu and Nailong He. These partnerships have fostered an environment of innovation and creativity, leading to the successful development of new technologies.

Conclusion

Guichuang Zhu's contributions to the field of semiconductor devices exemplify the impact of innovative thinking in technology. His patent and career achievements highlight the importance of collaboration and expertise in driving advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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