Location History:
- Affoltern am Albis, CH (1988)
- Affoltern am Alhis, CH (1989)
Company Filing History:
Years Active: 1988-1989
Title: Guenther Harbeke: Innovator in SIMOX Technology
Introduction
Guenther Harbeke is a notable inventor based in Affoltern am Albis, Switzerland. He has made significant contributions to the field of semiconductor technology, particularly in the area of SIMOX (Silicon-On-Insulator) wafers. With a total of 2 patents, his work has advanced the understanding and application of substrate temperature determination and optical reflectance methods.
Latest Patents
One of Harbeke's latest patents is titled "Determination of substrate temperature used during oxygen implantation." This invention provides graphs and a method for determining the substrate temperature during the oxygen implantation of SIMOX wafers. The method establishes a relationship between the wavelength of minimum transmittance for infrared energy and the implantation temperature. These relationships are expressed in the form of graphs for various selected oxygen doses and energy levels.
Another significant patent is the "Optical reflectance method of examining a SIMOX article." This invention offers an optical method for quickly, easily, and accurately determining the degree of amorphism, surface roughness, and presence of a contaminating film on the surface of a SIMOX article. The reflectances of the SIMOX material and a reference single crystalline silicon material are compared. Reflectances are obtained at three selected wavelengths and used to evaluate three simultaneous equations that yield values for parameters A, B, and C, representing the degree of amorphism, surface roughness, and surface contamination, respectively.
Career Highlights
Guenther Harbeke has had a distinguished career, working at General Electric Company, where he has been able to apply his innovative ideas in practical settings. His expertise in semiconductor technology has made him a valuable asset to the company and the industry as a whole.
Collaborations
Harbeke has collaborated with various professionals in his field, including his coworker Lubomir L Jastrzebski. Their combined efforts have contributed to advancements in semiconductor research and development.
Conclusion
Guenther Harbeke's contributions to the field of SIMOX technology through his patents and work at General Electric Company highlight his role as an influential inventor. His innovative methods for determining substrate temperature and examining SIMOX articles continue to impact the semiconductor industry positively.
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