The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 1988
Filed:
Apr. 23, 1987
Applicant:
Inventors:
Guenther Harbeke, Affoltern am Albis, CH;
Lubomir L Jastrzebski, Plainsboro, NJ (US);
Assignee:
General Electric Company, Schenectady, NY (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N / ; G01T / ; G01J / ;
U.S. Cl.
CPC ...
2503581 ; 25037001 ; 250372 ;
Abstract
The present invention provides an optical method of quickly, easily, and accurately determining the degree of amorphism, surface roughness, and presence of a contaminating film on the surface of a SIMOX article. The reflectances of the SIMOX material and a reference single crystalline silicon material are compared. Reflectances are obtained at three selected wavelengths and used to evaluate three simultaneous equations which yield values for the parameters A, B, and C when A, B, and C represent the degree of amorphism, surface roughness, and surface contamination respectively.