Guangjun Huang

Title: Innovations by Guangjun Huang

Introduction

Guangjun Huang is a notable inventor based in Singapore, recognized for his contributions to the field of semiconductor technology. He has developed innovative methods that enhance the efficiency of manufacturing processes in the electronics industry. His work has led to the filing of a patent that addresses critical challenges in the cleaning of copper lines.

Latest Patents

One of Guangjun Huang's significant patents is titled "Method of cleaning post-etch residues on a copper line." This patent describes a method that involves providing a copper line divided into a first region and a second region. A dielectric layer is formed on the copper line, which is then etched to create openings. The method ensures that the number of openings in the first region exceeds those in the second region. During the etching process, a potential difference is established between the two regions of the copper line. Finally, the dielectric layer and the copper line are cleaned using a solution with a specific pH value that correlates with the potential difference.

Career Highlights

Guangjun Huang is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to apply his innovative ideas in practical settings, contributing to advancements in semiconductor manufacturing.

Collaborations

Throughout his career, Guangjun Huang has collaborated with esteemed colleagues, including Ming Sheng Xu and Ching-Long Tsai. These collaborations have fostered a productive environment for innovation and have led to significant advancements in their respective fields.

Conclusion

Guangjun Huang's contributions to the semiconductor industry through his innovative patent demonstrate his expertise and commitment to advancing technology. His work continues to influence the manufacturing processes within the electronics sector.