Guang-qi Zhang

Title: The Innovative Mind of Guang-qi Zhang

Introduction

Guang-qi Zhang is a prominent inventor based in Beijing, China. He has made significant contributions to the field of semiconductor technology, particularly with his innovative logic gate device. His work exemplifies the intersection of creativity and engineering, showcasing the potential of modern technology.

Latest Patents

Guang-qi Zhang holds a patent for a logic gate device. The device includes a gate electrode, a gate insulating layer, a bottom electrode, a two-dimensional semiconductor layer, a first top electrode, and a second electrode. The gate insulating layer is positioned on the gate electrode, while the bottom electrode is situated on the gate insulating layer. The two-dimensional semiconductor layer is located on the bottom electrode and simultaneously covers the gate insulating layer. The first top electrode and the second electrode are placed on the two-dimensional semiconductor layer. Notably, the bottom electrode, the two-dimensional semiconductor layer, and the gate insulating layer create an air gap, which is distributed on both sides of the bottom electrode. The gate electrode is designed to connect a gate voltage, and the first and second top electrodes are configured to connect a signal input terminal. This innovative design enhances the functionality and efficiency of logic gate devices.

Career Highlights

Throughout his career, Guang-qi Zhang has worked with esteemed institutions, including Tsinghua University and Hon Hai Precision Industry Co., Ltd. His experience in these organizations has allowed him to collaborate with leading experts in the field and contribute to groundbreaking research and development.

Collaborations

Guang-qi Zhang has collaborated with notable colleagues such as Yang Wei and Shou-Shan Fan. These partnerships have fostered an environment of innovation and have led to significant advancements in semiconductor technology.

Conclusion

Guang-qi Zhang's contributions to the field of logic gate devices highlight his innovative spirit and dedication to advancing technology. His work continues to inspire future generations of inventors and engineers.