Griffin John Kennedy

Title: Innovations of Griffin John Kennedy

Introduction

Griffin John Kennedy is a notable inventor based in Berkeley, CA. He has made significant contributions to the field of metallization stack structures for logic and memory applications. With a total of 4 patents to his name, Kennedy's work has had a substantial impact on the industry.

Latest Patents

Kennedy's latest patents include innovative methods for the deposition of films using molybdenum precursors. These patents provide low resistance metallization stack structures and related methods of fabrication. In some embodiments, thin metal oxynitride or metal nitride nucleation layers are deposited, followed by the deposition of a pure metal conductor. The nucleation layer is amorphous, which templates large pure metal film grain growth and reduces resistivity. Furthermore, certain embodiments of the methods described convert most or all of the metal oxynitride nucleation layer to a pure metal layer, further lowering the resistivity. Another significant patent involves atomic layer deposition of metal films, which also focuses on low resistance metallization stack structures for logic and memory applications.

Career Highlights

Griffin John Kennedy is currently employed at Lam Research Corporation, where he continues to innovate and develop new technologies. His work is crucial in advancing the capabilities of metallization processes in the semiconductor industry.

Collaborations

Kennedy collaborates with talented coworkers, including Joshua Collins and Hanna Bamnolker, who contribute to the innovative environment at Lam Research Corporation.

Conclusion

Griffin John Kennedy's contributions to the field of metallization stack structures are noteworthy. His patents reflect a commitment to advancing technology in logic and memory applications. His work continues to influence the industry positively.