Gregory Wayne Dibello

Title: Gregory Wayne Dibello: Innovator in Silicon Film Technology

Introduction

Gregory Wayne Dibello is a notable inventor based in Mahopac, NY (US). He has made significant contributions to the field of materials science, particularly in the development of silicon films. His innovative work has led to the creation of a patented compound that enhances the properties of polysilicon films.

Latest Patents

Dibello holds a patent for the "Deposition of carbon and nitrogen doped poly silicon films, and retarded boron diffusion and improved poly depletion." This invention involves a compound that includes at least silicon (Si), nitrogen (N), and carbon (C) in various combinations. The patent describes a method for producing films by mixing silane or a silane derivative with specific compounds, such as bis-tertiary butyl amino silane (BTBAS). The films can be controllably doped with carbon and/or nitrogen, allowing for tailored properties based on the reagents and conditions used.

Career Highlights

Throughout his career, Gregory Wayne Dibello has worked with prominent companies in the technology sector. He has been associated with Applied Materials, Inc. and IBM, where he contributed to advancements in semiconductor manufacturing and materials engineering. His expertise in silicon film technology has positioned him as a valuable asset in these organizations.

Collaborations

Dibello has collaborated with notable professionals in his field, including Ashima B Chakravarti and Anita Madan. These partnerships have fostered innovation and have been instrumental in the development of new technologies.

Conclusion

Gregory Wayne Dibello's contributions to the field of silicon film technology are noteworthy. His patented innovations and collaborations with leading companies and professionals highlight his impact on the industry. His work continues to influence advancements in materials science and semiconductor technology.