Company Filing History:
Years Active: 2022
Title: Gregory Toepperwein: Innovator in Optical Proximity Correction
Introduction
Gregory Toepperwein is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of optical proximity correction (OPC) in integrated circuit (IC) design. His innovative work has led to the development of a unique method that enhances the accuracy of lithography processes.
Latest Patents
Toepperwein holds a patent for a "Multilayer optical proximity correction (OPC) model for OPC correction." This method involves creating a semi-physical model of a mask for a current layer in an IC design layout. The model utilizes physical parameters of the lithography process to specify contours of various features of the mask. The process determines if the current layer is deformed by overlapping reference layers. If deformation is detected, the semi-physical model and design information are input into a trained machine learning algorithm. This generates a contour shift prediction for the current layer, which is then used for multilayer OPC correction. He has 1 patent to his name.
Career Highlights
Gregory Toepperwein is currently employed at Intel Corporation, where he continues to push the boundaries of innovation in semiconductor technology. His work is crucial in improving the efficiency and accuracy of IC manufacturing processes.
Collaborations
Toepperwein collaborates with talented individuals such as Hyungjin Ma and Nabil Laachi. Their combined expertise contributes to the advancement of technologies in the field of optical proximity correction.
Conclusion
Gregory Toepperwein's contributions to optical proximity correction demonstrate his commitment to innovation in the semiconductor industry. His work not only enhances the accuracy of IC design but also showcases the importance of collaboration in technological advancements.