Company Filing History:
Years Active: 2003-2005
Title: The Innovative Contributions of Gregoire Grandremy
Introduction
Gregoire Grandremy is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of semiconductor technology, particularly in the area of etching processes. With a total of 2 patents to his name, Grandremy continues to push the boundaries of innovation in his field.
Latest Patents
One of his latest patents is an etching process for a two-layer metallization. This novel etching process, also known as dual damascene patterning, is both simple and cost-effective. It reliably prevents the formation of fences during the etching process in the region of the polymer intermediate layer. The etching of the oxide layer and the polymer intermediate layer is achieved through a CFARC open process, which offers high selectivity with respect to the photoresist and allows for a lengthened etching time.
Another significant patent is a method for patterning an organic antireflection layer. In this process, an antireflection coating (ARC) polymer layer is patterned using DUV (deep ultraviolet) lithography, followed by an ARC open etching step and subsequent etching of the metal layer. This method results in low resist consumption and steeper resist sidewalls, thanks to the ARC polymer intermediate layer being etched with a CF ARC open process that maintains high selectivity with respect to the photoresist. The gas flows for this process are carefully set within specific ranges to optimize performance.
Career Highlights
Gregoire Grandremy is currently employed at Infineon Technologies AG, a leading company in semiconductor solutions. His work at Infineon has allowed him to develop and refine innovative processes that enhance the efficiency and effectiveness of semiconductor manufacturing.
Collaborations
Throughout his career, Grandremy has collaborated with talented coworkers, including Gabriela Brase and Matthias Lehr. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Gregoire Grandremy's contributions to the field of semiconductor technology are noteworthy and impactful. His innovative patents and collaborative efforts continue to shape the future of the industry.