The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2003
Filed:
Feb. 11, 2002
Applicant:
Inventors:
Matthias Lehr, Dresden, DE;
Gregoire Grandremy, Dresden, DE;
Assignee:
Infineon Technologies AG, Munich, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/131 ; G03F 7/00 ; B32B 9/00 ;
U.S. Cl.
CPC ...
H01L 2/131 ; G03F 7/00 ; B32B 9/00 ;
Abstract
An antireflection coating (ARC) polymer layer is patterned by DUV (deep ultraviolet) lithography followed by an ARC open etching step and subsequent etching of the metal layer. Low resist consumption and hence steeper resist sidewalls are achieved by virtue of the ARC polymer intermediate layer being etched with a CF ARC open process with high selectivity with respect to the photoresist. The gas flows are set to the following ranges: CF 35-45 sccm, CHF 17-23 sccm, O 5-7 sccm and Ar 80-120 sccm.