This inventor holds 2 USPTO granted patents. Top assignees: Brewer Science, Inc., Other. Active years: 1991-1994.
Company Filing History:

Years Active: 1991-1994
Title: Innovations of Gregg Barnes in Microlithography
Introduction
Gregg Barnes is an accomplished inventor based in Lebanon, MO (US). He has made significant contributions to the field of microlithography, holding a total of 2 patents. His work focuses on developing advanced materials that enhance the efficiency and effectiveness of lithographic processes.
Latest Patents
Barnes' latest patents include innovative solutions such as "Base-soluble polyimide release layers for use in microlithographic" and "Base-soluble release layer compositions for microlithographic processing." These patents disclose compositions comprising nonamic acid functionalized polyamic acid/imide resins. These materials allow for concurrent lithographic development of photoresist and release layers, facilitating effective lift-off by alkaline media, even after high imidization. Another notable patent is the "Method for making polyimide microlithographic compositions soluble in," which involves condensing nonamic acidic functionalized diamines and dianhydrides to produce abnormal acid functionalized polyamic acid/imide resins. This method surprisingly affords effective lift-off by alkaline media, even after higher imidization.
Career Highlights
Throughout his career, Barnes has worked with Brewer Science, Inc., where he has contributed to various innovative projects. His expertise in microlithography has positioned him as a key player in the development of advanced materials for the industry.
Collaborations
Barnes has collaborated with notable individuals such as Tony D Flaim and Terry Lowell Brewer. These collaborations have further enriched his work and contributed to the advancements in microlithographic technologies.
Conclusion
Gregg Barnes is a notable inventor whose contributions to microlithography have led to significant advancements in the field. His innovative patents and collaborations highlight his commitment to enhancing lithographic processes.