The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 1994
Filed:
Mar. 30, 1989
Applicant:
Inventors:
Tony Flaim, St. James, MO (US);
James E Lamb, III, Rolla, MO (US);
Gregg Barnes, Lebanon, MO (US);
Terry Brewer, Rolla, MO (US);
Assignee:
Brewer Science, Inc., Rolla, MO (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08G / ; C08G / ; C08G / ;
U.S. Cl.
CPC ...
528353 ; 528125 ; 528128 ; 528174 ; 528176 ; 528183 ; 528184 ; 528185 ; 528188 ; 528219 ; 528220 ; 528229 ; 528272 ; 528293 ; 528352 ;
Abstract
Base-soluble release layer compositions for microlithographic processing, comprising nonamic acid functionalized polyamic acid/imide resins are disclosed. These materials permit concurrent lithographic development of photoresist and release layers. They also afford effective lift-off, by alkaline media, even after high imidization.
Quick Actions:
Flaim, Tony. (1994). Base-soluble polyimide release layers for use in microlithographic (U.S. Patent No. 5281690). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5281690
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile