Goswami Indranil

Title: Innovations by Goswami Indranil in Semiconductor Manufacturing

Introduction

Goswami Indranil is a notable inventor based in Singapore, recognized for his contributions to the field of semiconductor manufacturing. He has developed innovative solutions that enhance the efficiency and accuracy of lithographic processes in integrated circuit device fabrication.

Latest Patents

Indranil holds a patent for an invention titled "In-line focus monitor structure and method using top-down SEM." This invention relates to a test structure formed on a reticle simultaneously with a pattern used to build an integrated circuit device. The test structure features a large rectangular end with several rectangular shapes extending in a parallel array. The width of these extensions matches the spacing between them and corresponds to the minimum feature size in the lithographic process being monitored. A CD SEM is employed to measure the edge width of the convex and concave sections of the structure as printed in photoresist at various focus settings. The resulting plot of edge width versus focus setting helps identify the optimal focus setting for the lithographic process.

Career Highlights

Goswami Indranil is currently associated with Chartered Semiconductor Manufacturing Ltd, where he applies his expertise in semiconductor technology. His work has significantly contributed to advancements in the industry, particularly in improving lithographic techniques.

Collaborations

Indranil has collaborated with esteemed colleagues such as Teng Hwee Ng and Hui-Kow Lim, further enhancing the innovative environment at Chartered Semiconductor Manufacturing Ltd.

Conclusion

Goswami Indranil's contributions to semiconductor manufacturing through his innovative patent demonstrate his commitment to advancing technology in this critical field. His work continues to influence the efficiency of integrated circuit device fabrication processes.