Company Filing History:

5 out of 5,267

Lockheed Martin Corporation

Years Active: 2005-2014

Loading Chart...

7 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8873025 - EUV collector system with enhanced EUV radiation collection (2014-10-28),

2. 8587768 - EUV collector system with enhanced EUV radiation collection (2013-11-19),

3. 7928351 - Near field diversity method for estimation and correction of aberrations (2011-04-19),

4. 7759621 - Method and system of performing multiple observations using a space-based telescope comprising independently targetable sensor units (2010-07-20),

5. 7617060 - Extracting higher order information from scene-based Shack-Hartmann wave-front sensing (2009-11-10),

6. 7397018 - Amplitude and phase controlled adaptive optics system (2008-07-08),

7. 6909512 - Method and apparatus for estimating piston using a grism (2005-06-21),

Title: Innovator Spotlight: Gopal Vasudevan - Revolutionizing EUV Lithography Systems

Introduction:

Gopal Vasudevan, a brilliant inventor based in San Jose, CA, has made significant contributions to the field of extreme ultraviolet (EUV) lithography systems. With a total of 7 patents to his name, Gopal's innovative work has paved the way for enhanced EUV radiation collection, ultimately revolutionizing the performance of lithography systems.

Latest Patents:

Among Gopal Vasudevan's latest patents is the 'EUV Collector System with Enhanced EUV Radiation Collection.' This cutting-edge system incorporates a collector mirror and a radiation-collection enhancement device (RCED) to optimize the angular distribution of EUV radiation. By redirecting and enhancing the radiation passing through the aperture, this invention significantly boosts the amount of usable EUV radiation available to the illuminator, thereby enhancing the overall performance of EUV lithography systems.

Career Highlights:

Gopal Vasudevan's illustrious career includes notable stints at renowned companies such as Lockheed Martin Corporation and Media Lario S.r.l.. Through his expertise and innovative approach to technical challenges, Gopal has been instrumental in driving advancements in EUV lithography technologies.

Collaborations:

Throughout his career, Gopal Vasudevan has collaborated with esteemed professionals in the industry, including Eric H Smith and Robert Duncan Reardon. Together, they have worked tirelessly to push the boundaries of innovation in EUV lithography systems, setting new standards for efficiency and performance.

Conclusion:

In conclusion, Gopal Vasudevan stands as a pioneering figure in the realm of EUV lithography systems, with his groundbreaking inventions reshaping the landscape of modern semiconductor manufacturing. His ingenuity and dedication to technological advancements continue to inspire future generations of inventors and researchers in the pursuit of excellence in the field of lithography.

This text is generated by artificial intelligence and may not be accurate.

Please report any incorrect information to support@idiyas.com